At least, he barely survived by female guests who came to see Dae-hyun. In order to save labor costs, the whole family spent 24 hours running around a convenience store, and eventually Yong-pil, his father, collapsed. So Dae-hyun was working 40 hours non-stop and just before he died, he posted a job search notice.
The person who came for the part-time job interview is Jung Saet-byul. Despite her amazing athletic ability and great fighting skills, she is 22 years old, who loves flowers, likes friends, and enjoys retro songs and fashion.
She has a history of settling down her constituency by fighting in high school. Three years later, the year-old Saet-byul meets Dae-hyun again. Daehyun was the head of a convenience store in Shinsung-dong, Jongno-gu, which employ a late-night part-time workers. Somehow, she has entered Jongno Shinseong branch as a temporary part-time job. However, Dae-hyun recalls his old memories and looks for excuses to kick her out all day long.
Career woman with intelligence, beauty, and ability. Although she is the daughter of the second largest shareholder of the convenience store headquarters, she proudly joined the company with her ability and was promoted with obvious record. Although the environment is more favorable than others, she does not show off or put it forward.
This is because she is confident that she can prove the ability of Yoo Yeon-joo herself without a background. As the youngest team leader, while working as a workaholic, a new employee named Choi Hyun-hyun comes to her attention. The transparent substrate 10 may be formed of an insulating material that is transparent to visible light.
Examples of such insulating materials include glass, polyethylene terephthalate PET , polycarbonate PC , and the like. The first conductive layer 20 may be formed of a conductive material which is transparent to visible light; examples of such conductive materials include indium tin oxide ITO , PEDOT poly 3,4-ethylenedioxythiophene , and the like.
The first conductive layer 20 may be formed by a deposition process such as electronic beam deposition and sputtering. The electrode layer 20 a may be formed through a photolithography process.
In the photolithography process, a photoresist layer having a uniform thickness may be stacked on the entire upper surface of the first conductive layer 20 through a spin process. The photoresist may be hardened by partially or selectively irradiating the photoresist layer with ultraviolet rays. A photoresist mask having a plurality of slits may be formed by removing an unhardened portion of the photoresist layer using an etching solution.
The electrode layer 20 a may be formed by etching the first conductive layer 20 exposed through the slits of the photoresist mask. Since a lower surface of the transparent substrate 10 may be exposed to the outside, the light shielding layer 30 for shielding visible light may be stacked at a periphery of the upper surface of the transparent substrate 10 to prevent an outer periphery of a central part included in an effective display region from being displayed to an observer.
The light shielding layer 30 may be formed through a process such as black ink printing. In order to form connecting lines, the mask 40 may be stacked such that a mask central part 42 located in an effective display region and a side end of the light shielding layer 30 are spaced apart from each other. That is, the mask 40 may be stacked at a portion other than a region where the electrode layer 20 a and the connecting terminal see FIG. Meanwhile, although it is illustrated that a part of the electrode layer 20 a is located within a space where the connecting lines are to be formed in this example, a portion of the electrode layer 20 a may not exist within the space where the connecting lines are to be formed under the condition where the connecting lines are connected to the electrode layer 20 a.
A transparent circuit substrate having such connecting lines are a part of the present disclosure. The mask 40 may be formed by printing a plating preventing peelable ink that can be easily removed by peeling without a separate separation process, or through a process of attaching a bonding tape that may removed by detaching the bonding tape.
When the peelable ink is used, after being printed in a liquid state, the peelable ink is dried and hardened. The hardened peelable ink may be peeled and removed after the step S 50 of forming a second conductive layer and the step S 60 of forming connecting lines. When the bonding tape is used, the bonding tape may be detached and removed after the step S 50 of forming a second conductive layer and the step S 60 of forming connecting lines.
A mask peripheral part 44 may be stacked on a portion of the upper surface of the light shielding layer 30 such that the connecting lines extend to the upper surface of the light shielding layer That is, an inner portion of the upper surface of the light shielding layer 30 may be exposed to the outside.
That is, the second conductive layer 50 may be stacked so as to completely surround an entire outer surface of the mask central part 42 and an outer surface other than one side surface of the mask peripheral part The connecting lines 50 a connected to the electrode layer 20 a may extend from the upper surface of the transparent substrate 10 to the upper surface of the light shielding layer The connecting terminals 60 may be configured to apply electrical currents to the electrode layer 20 a.
In addition, providing the connecting terminals 60 on the outside of the electrode layer 20 a along the periphery of the transparent substrate 10 may make it easy to access the connecting terminals 60 from an outside of the transparent circuit substrate. The connecting terminals 60 may be formed of a same material as the electrode layer 20 a or may be formed of another material. For example, the connecting terminals 60 may be formed of an opaque conductive material such as silver, a transparent conductive ink, and the like.
In the above-mentioned example of a method of manufacturing a transparent circuit substrate for a touch screen, since the light shielding layer 30 is formed after the electrode layer 20 a is formed, it is possible to prevent the degradation of quality of the electrode layer 20 a due to an outgas from the light shielding layer In addition, an increase in a surface resistance of the electrode layer 20 a , a degradation of a light transmission, and a degradation of visibility due to a change in chrominance that may be caused by the formation of the light shielding layer 30 can also be prevented.
Further, since the connecting lines 50 a are formed with the mask 40 being stacked on the light shielding layer 30 according to the method, the light shielding layer 30 may be prevented from being damaged or discolored due to the heat that may be generated during a deposition process. Hereinafter, an example of a touch screen to which the transparent circuit substrate may be applied is described in detail. It is noted that the transparent circuit substrate, and the method of manufacturing the same, may be applied to various touch screens.
The touch screen described below is simply an example of the various touch screens that may be used with such a transparent circuit substrate. It is noted that since the transparent circuit substrate 1 may be applied in an overturned state to the touch screen as illustrated in FIG. Further, a repeated description of the transparent circuit substrate 1 will be omitted. The touch screen may include a display unit , a film , a transparent circuit substrate 1 having a transparent substrate 10 and an upper electrode layer 20 a , a lower electrode layer , and first and second bonding members and The display unit may include a plurality of pixels, and may display an image through the pixels.
Although only a portion, such as the central part, of an upper surface of the display unit may be included in an effective display region of the touch screen displayed to an observer, the entire upper surface of the display unit may be included in an effective display region, as in the illustrated example.
The liquid crystal display may display an image under the control of a control unit not shown. Such a liquid crystal display may include a liquid crystal panel including a liquid crystal layer in order to display an image, as well as a backlight unit BLU for providing light to the liquid crystal panel.
The liquid crystal panel may include upper and lower glass substrates that are disposed on and under the layer of liquid crystal. Such a lower glass substrate may include thin film transistors and pixel electrodes, and the upper glass substrate may include a common electrode.
The liquid crystal panel may further include upper and lower polarization plates disposed on and under the liquid crystal panel to linearly polarize the input light respectively. Te polarization directions of the upper and lower polarization plates may be perpendicular to each other. The film may be disposed on the display unit and may include a lower electrode layer that is stacked on an upper end i. The areas occupied by the upper and lower electrode layers 20 a and respectively may coincide with the area of the effective display region.
The film may be formed of an insulating material that is transparent to visible light. The film may be attached to the display unit by, for example, a bonding process using a first bonding member That is, a portion of a lower end i. One or both of the first and second bonding members and may be formed of an insulating material that is transparent to visible light.
The bonding members and may include an optical clear adhesive tape OCA tape , an adhesive or adhering material , and an ultraviolet ray hardening resin which are transparent to visible light. The OCA tape may be double-sided, and may be formed of a material such as acryl, silicon, and the like. In addition, the lower electrode layer may extend along a first direction, for example, the x-axis or horizontal direction. The lower electrode lines may be disposed at regular or irregular directions along a second direction.
For example, the lower electrode lines may extend along the y-axis or vertical direction, crossing the first direction and perpendicular to the first direction. The line widths of the lower electrode lines and the intervals between the lower electrode lines may be arbitrarily set, and the interval between the lower electrode lines may be set to 4 mm, for example.
The upper electrode layer 20 a may be formed in the same fashion as the lower electrode layer Referring back to FIG. That is, the lower connecting terminals may be disposed on the outside of the lower electrode layer , i. Then, the central part of the film may be included in the effective display region of the touch screen , and the periphery of the film may be set to correspond to a region located on the outside of the effective display region, i.
The lower connecting terminals may be electrically connected to the lower electrode layer through the lower connecting lines The lower light shielding layer , the lower connecting lines , and the lower connecting terminals may be formed in the same fashion as the upper light shielding layer 30 , the upper connecting lines 50 a , and the upper connecting terminals 60 , respectively. Meanwhile, although it has been described above that the film includes the lower light shielding layer to show that the method of manufacturing a transparent circuit substrate 1 for a touch screen can be applied to the film in the above example, the lower light shielding layer may be removed in other examples.
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